机译:CuInS2 sub>薄膜的脉冲喷涂射频等离子体增强化学气相沉积
Department of Chemistry Idaho State University Pocatello ID 83209 USA;
Department of Chemistry Idaho State University Pocatello ID 83209 USA;
Department of Chemistry Idaho State University Pocatello ID 83209 USA;
Department of Chemistry Idaho State University Pocatello ID 83209 USA;
Department of Chemistry Idaho State University Pocatello ID 83209 USA;
Ohio Aerospace Inst. 22800 Cedar Point Rd. Cleveland OH 44142 USA;
Ohio Aerospace Inst. 22800 Cedar Point Rd. Cleveland OH 44142 USA;
Photovoltaic Branch NASA GRC Cleveland OH 44135 USA;
PECVD; CuInS2; Liquid-spray; Single-source precursor;
机译:脉冲喷涂射频等离子体增强CuInS2薄膜的化学气相沉积
机译:射频和微波等离子体增强化学气相沉积法沉积碳氮化硼(BCN)薄膜的表征科学出版物
机译:在低基板温度下通过等离子体增强化学气相沉积和热线化学气相沉积沉积的薄膜的机械和压阻特性
机译:等离子体功率和沉积压力对等离子体增强化学气相沉积沉积的低介电常数等离子体聚合环己烷薄膜的影响
机译:通过铝的物理气相沉积和等离子体增强的三甲基硅烷化学气相沉积产生的薄膜的原位X射线光电子能谱分析。
机译:射频等离子体增强化学气相沉积(RF PECVD)反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
机译:射频和微波等离子体增强化学气相沉积法沉积碳氮化硼(BCN)薄膜的表征