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首页> 外文期刊>Plasma Chemistry and Plasma Processing >Effects of Oxygen Addition and Treating Distance on Surface Cleaning of ITO Glass by a Non-Equilibrium Nitrogen Atmospheric-Pressure Plasma Jet
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Effects of Oxygen Addition and Treating Distance on Surface Cleaning of ITO Glass by a Non-Equilibrium Nitrogen Atmospheric-Pressure Plasma Jet

机译:加氧和处理距离对非平衡氮常压等离子体射流清洗ITO玻璃表面的影响

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摘要

Effects of oxygen addition and treating distance on cleaning organic contaminants on stationary and non-stationary (1–9 cm/s) ITO glass surfaces by a parallel-plate nitrogen-based dielectric barrier discharge (DBD) are investigated experimentally; the DBD is driven by a 60 kHz bipolar quasi-pulsed power source. The results show that two regimes of favorable operating condition for improving the hydrophilic property of the surface (reducing the contact angle from 84° to 25–30°) are found. The measured spatial distribution of NO-γ UV emission, O3 concentration and OES spectra are shown to strongly correlate with the measured hydrophilic property. At the near jet downstream locations (z 10 mm), where the ratio of oxygen to nitrogen is lower, only the long-lived metastable plays a major role in cleaning the ITO glass surface.
机译:实验研究了通过平行板氮基介电阻挡放电(DBD)来研究氧气添加和处理距离对清洁固定和非固定(1–9 cm / s)ITO玻璃表面有机污染物的影响; DBD由60 kHz双极准脉冲电源驱动。结果表明,发现了两种有利的操作条件,它们可以改善表面的亲水性(将接触角从84°减小到25–30°)。结果表明,测得的NO-γUV发射,O 3 浓度和OES光谱的空间分布与测得的亲水性密切相关。在氧与氮之比较低的近喷射下游位置(z 10 mm)处,只有长寿命的亚稳态在清洁ITO玻璃表面中起主要作用。

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