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Metallic behavior in low-dimensional honeycomb SiB crystals: A first-principles prediction of atomic structure and electronic properties

机译:低维蜂窝SiB晶体中的金属行为:原子结构和电子性质的第一性原理预测

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摘要

We present a detailed analysis of the atomic and electronic structure of a two-dimensional monolayer of boron and silicon elements within periodic density functional theory. The proposed h-SiB sheet is a structural analog of hexagonal boron nitride (h-BN) and exhibits a good structural stability, compared to the structure of silicene. The calculated cohesive energy of an infinite sheet of h-SiB is of 4.71 eV/atom, whereas the corresponding value for silicene is 4.09 eV/atom. However, h-SiB sheets are not able to be stacked into a three-dimensional graphitelike structure, leading to a new hexagonal phase. On the other hand, h-SiB is predicted to roll up into single-walled silicon boron nanotubes (SWSiBNTs) of which we examine the electronic properties of some zigzag and armchair tubes. The strain energy of the SWSiBNTs are four to five times lower than the strain energy of the corresponding carbon nanotubes. In contrast to more polar honeycomb monolayers, the h-SiB sheet is not semiconducting or semimetallic. It has a delocalized charge density like graphene, but the n band and the two highest occupied a bands are only partly filled. This results in a high density of states around the Fermi level and a metallic behavior of the h-SiB sheet. Interestingly, all the low-dimensional h-SiB-based structures, including the smallest to the largest stable tubes studied here, are predicted to form metallic systems.
机译:我们提出了在周期性密度泛函理论内的二维二维硼和硅元素单分子层的原子和电子结构的详细分析。所提出的h-SiB片是六方氮化硼(h-BN)的结构类似物,与硅结构相比,具有良好的结构稳定性。无限片h-SiB的计算凝聚能为4.71 eV /原子,而硅的相应值为4.09 eV /原子。然而,h-SiB片不能堆叠成三维石墨状结构,导致新的六方相。另一方面,预计h-SiB会卷成单壁硅硼纳米管(SWSiBNT),我们将检查其中一些之字形和扶手椅形管的电子特性。 SWSiBNT的应变能比相应的碳纳米管的应变能低四到五倍。与极性更大的蜂窝状单分子层相反,h-SiB片不是半导体或半金属。它具有像石墨烯一样的离域电荷密度,但是n谱带和两个最高占据谱带仅被部分填充。这导致在费米能级附近的状态密度很高,并且h-SiB板的金属行为。有趣的是,预计所有基于低维h-SiB的结构,包括在此研究的最小到最大的稳定管,都将形成金属系统。

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