Prediction of Advanced Oxidation Performance in Pilot UV/H₂O₂ Reactor Systems with MP- and LP-UV Lamps

摘要

Advanced oxidation processes, are becoming important barriers against organic micropollutants in water treatment. To guarantee safe drinking water, it is important to be able to adjust the process parameters to the circumstances. Modeling can play an important role in this respect. Two models, UVPerox I and UVPerox II, were developed, in which the kinetic parameters of the process are combined with computational fluid dynamics (CFD), accounting for the hydrodynamics and UV irradiation distribution of the reactors applied. Both models were applied to several pilot reactors, and good accordance was observed between predicted and experimental data.View full textDownload full textKeywordsUV Oxidation, Advanced Oxidation, CFD, UV Lamps, Micropollutants, ModelingRelated var addthis_config = { ui_cobrand: "Taylor & Francis Online", services_compact: "citeulike,netvibes,twitter,technorati,delicious,linkedin,facebook,stumbleupon,digg,google,more", pubid: "ra-4dff56cd6bb1830b" }; Add to shortlist Link Permalink http://dx.doi.org/10.1080/01919512.2011.650598