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Laser induced the tunable permittivity of Epsilon-Near-Zero induced in indium tin oxide thin films

机译:激光诱导在氧化铟锡薄膜中诱导的epsilon-yat0的可调谐介电常数

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摘要

Tunable permittivity of Epsilon-Near-Zero (ENZ) of ITO thin films were realized by Nd: YAG pulse laser irradiation. The effects of different pulsed laser power irradiation on the structure, morphology and optical properties of the samples were investigated via X-ray diffraction, atomic force microscopy, UV-VIS-NIR double beam spectrometer, spectroscopic ellipsometry and Raman system, respectively. Those results indicate that pulse laser irradiation has the effects on the preferential orientation and the permittivity wavelength region of ENZ from 1137 to 2001 nm. The variations of Raman spectra further confirms that the laser irradiation can induce some defects driving the special optical characteristics of ITO films. In addition, the results of Finite-Difference Time-Domain are in good agreement with those of the experiments.
机译:通过ND:YAG脉冲激光照射实现ITO薄膜的ε-近零(ENZ)的可调谐介电常数。通过X射线衍射,原子力显微镜,UV-Vis-Nir双光束光谱仪,光谱椭圆形和拉曼系统研究了不同脉冲激光功率辐射对样品的结构,形态和光学性质的影响。那些结果表明,脉冲激光照射具有对优先取向的影响和enz的优先取向和enez的介电常数波长区域。拉曼光谱的变化进一步证实激光照射可以诱导驱动ITO膜的特殊光学特性的一些缺陷。此外,有限差分时间域的结果与实验的符合良好。

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