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Comparative optical study of Eu~(3+) ions doping in InGaN/GaN quantum dots and GaN layer grown by molecular beam epitaxy

机译:欧盟〜(3 +)离子掺杂IngaN / GaN量子点和GaN层的比较光学研究通过分子束外延生长

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摘要

We report on a comparative optical study of InGaN:Eu quantum dots (QDs) and GaN:Eu layer grown by molecular beam epitaxy (MBE). Analysis of the ~5D_0 → ~7F_2 transition as a function of the excitation wavelength shows that Eu~(3+) ions in InGaN:Eu QDs are located inside InGaN QDs and also in the GaN barrier layer. The existence of Eu~(3+) ions in the GaN barrier layer is explained by Eu segregation/diffusion during growth. For Eu~(3+) ions located inside InGaN QDs the photoluminescence (PL) shows only a slight decrease with temperature from 5 K to 300 K. In contrast, the PL from Eu~(3+) ions in the GaN barrier layer or in GaN thick layer shows a much more pronounced thermal quenching.
机译:我们报告了IngaN的比较光学研究:Eu量子点(QDS)和GaN:由分子束外延(MBE)生长的欧盟层。根据激发波长的函数分析〜5d_0→〜7f_2转换显示INGAN中的EU〜(3+)离子:EU QD位于IngaN QD中的内部,也在GaN阻挡层内。 GaN阻挡层中的Eu〜(3+)离子的存在是通过生长期间的欧氏偏析/扩散来解释。对于位于IngaN QD内部的Eu〜(3+)离子,光致发光(PL)仅略微降低5 k至300​​k的温度。相反,GaN屏障层中的欧盟〜(3+)离子的PL来自欧盟〜(3+)离子在GaN厚层显示出更明显的热淬火。

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