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Optical and chemical properties of mixed-valent rhenium oxide films synthesized by reactive DC magnetron sputtering

机译:反应性直流磁控溅射合成混合价-氧化物薄膜的光学和化学性质

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Mixed-valent rhenium oxide thin films were deposited using reactive magnetron sputtering employing a metallic rhenium target within an oxygen argon environment. The oxygen and argon flow rates were systematically varied, while the extinction coefficient, k, of the deposited layers was monitored using in situ spectroscopic ellipsometry. In situ monitoring was used to identify absorption features specific to ReO3, namely, the minimization of k brought on by the gap between interband absorption features in the UV at 310 nm and the onset of free electron absorption at wavelengths above 540 nm. Based on these results, oxygen flow ratios of 50% and 60% were shown to produce films having optical properties characteristic of ReO3, and thus, were selected for detailed ex situ characterization. Chemical analysis via X-ray photoelectron spectroscopy confirmed that all films consisted largely of ReO3, but had some contributions from Re2O3, ReO2 and Re2O7. Additional monitoring of the chemistry, as a function of environmental exposure time, indicated a correlation between structural instability and the presence of Re2O3 and Re2O7 in the films. Published by Elsevier B.V.
机译:使用反应性磁控溅射法在氧氩环境中使用金属rh靶沉积混合价的氧化oxide薄膜。系统地改变了氧气和氩气的流速,同时使用原位光谱椭圆偏振法监测了沉积层的消光系数k。使用原位监测来确定ReO3特有的吸收特征,即,由310 nm紫外线中的带间吸收特征之间的间隙带来的k最小化和在540 nm以上波长处的自由电子吸收的开始。基于这些结果,显示出50%和60%的氧气流量比产生具有ReO 3的光学特性的膜,因此选择用于详细的非原位表征。通过X射线光电子能谱进行化学分析证实,所有薄膜主要由ReO3组成,但具有Re2O3,ReO2和Re2O7的某些贡献。作为环境暴露时间的函数,对化学反应的另外监测表明,膜的结构不稳定性与Re2O3和Re2O7的存在之间存在相关性。由Elsevier B.V.发布

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