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首页> 外文期刊>Optical Materials >The effect of annealing process on the optical and microwave dielectric properties of transparent MgAl_2O_4 ceramics by spark plasma sintering
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The effect of annealing process on the optical and microwave dielectric properties of transparent MgAl_2O_4 ceramics by spark plasma sintering

机译:火花等离子体烧结退火工艺对透明MgAl_2O_4陶瓷光学和微波介电性能的影响

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摘要

Transparent MgAl_2O_4 ceramics were fabricated by using spark plasma sintering (SPS). The effects of annealing temperature on the optical and microwave dielectric properties were investigated by positron annihilation technique and X-ray photoelectron spectroscopy (XPS). The results showed that the optimal annealing temperature for the optical property improvement was 900 ℃ and the in-line transmittance was improved to 74.9% at the wavelength of 550 nm. The further elevation of annealing temperature damaged the optical performance due to the combination of oxygen vacancies. The Q ×f values of transparent MgAl_2O_4 ceramics were an overall increase from 800 ℃ to 1200 ℃, but decreased at 1300 ℃. It can be concluded that the annealing temperature plays an important role in the Q × f value, while a certain annealing temperature is corresponding to the best microwave dielectric property.
机译:透明MgAl_2O_4陶瓷通过火花等离子体烧结(SPS)制成。通过正电子an没技术和X射线光电子能谱(XPS)研究了退火温度对光学和微波介电性能的影响。结果表明,改善光学性能的最佳退火温度为900℃,在550 nm波长处的在线透射率提高到74.9%。退火温度的进一步升高由于氧空位的结合而损害了光学性能。透明MgAl_2O_4陶瓷的Q×f值从800℃升高到1200℃,但在1300℃时降低。可以得出结论,退火温度在Q×f值中起着重要作用,而一定的退火温度则对应于最佳的微波介电性能。

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