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Study on structure and optical properties of Bi_2O_3 thin films prepared by reactive pulsed laser deposition

机译:反应脉冲激光沉积制备Bi_2O_3薄膜的结构和光学性能

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Bi_2O_3 thin films were prepared onto glass substrates by pulsed laser deposition (PLD) at different O_2 pressures and substrate temperatures. The crystallinity, phase structure, grain size and surface roughness of PLD thin films were investigated by X-ray diffraction (XRD) and scanning probe microscopy (SPM) techniques, respectively. The optical transmission spectra of films were examined in order to study their energy gap. The results showed that the phases of obtained films were β-Bi_2O_3 and/or δ-Bi_2O_3, and their preferred orientation was (201) and (111), respectively; the average grain size and the surface roughness of films ranged from 20 nm to 120 nm and from 0.8 nm to 16 nm, respectively, depending on the preparing conditions. At different oxygen pressures (0.15-45 Pa), two energy gaps (E_g) of films were found, and their values were about 3.5 eV and 2.88 eV, respectively. At substrate temperatures of 75 ℃, 200 ℃ and 500 ℃, only one energy gap was obtained, and it decreased significantly from 3.72 eV to 3.25 eV with increasing substrate temperature from 75 ℃ to 500 ℃. The difference in the values of energy gap of investigated films can be mainly correlated with the phase composition of respective films.
机译:通过在不同的O_2压力和衬底温度下通过脉冲激光沉积(PLD)将Bi_2O_3薄膜制备到玻璃衬底上。通过X射线衍射(XRD)和扫描探针显微镜(SPM)技术分别研究了PLD薄膜的结晶度,相结构,晶粒尺寸和表面粗糙度。为了研究膜的能隙,检查了膜的光学透射光谱。结果表明,所得薄膜的相为β-Bi_2O_3和/或δ-Bi_2O_3,其优选取向分别为(201)和(111)。取决于制备条件,膜的平均晶粒尺寸和表面粗糙度分别在20nm至120nm和0.8nm至16nm的范围内。在不同的氧气压力(0.15-45 Pa)下,发现薄膜的两个能隙(E_g),其值分别为约3.5 eV和2.88 eV。在75℃,200℃和500℃的衬底温度下,仅获得一个能隙,并且随着衬底温度从75℃升高到500℃,它从3.72 eV显着降低到3.25 eV。被研究膜的能隙值的差异可以主要与各个膜的相组成相关。

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