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Densification of silicon carbide using oxy-nitride additives for space-based telescope mirror applications

机译:在天基望远镜镜应用中使用氮氧化物增稠的碳化硅致密化

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摘要

Densification behavior of alpha silicon carbide (SiC) during vacuum hot pressing was studied up to 1900℃ with sintering additives based on AIN and Y_2O_3 in different proportions. Near theoretical density was obtained with a total sintering additive content of < 4 vol.%. The microstruc-ture of SiC sintered with AIN + Y_2O_3 revealed fine equiaxed grains against the additional elongated grains exhibited by SiC sintered with AIN alone. The SiC having high density exhibited very good strength, elastic modulus, high thermal conductivity, low coefficient of thermal expansion and excellent polishability for telescope mirror applications.
机译:研究了不同比例的基于AIN和Y_2O_3的烧结助剂在高达1900℃的真空热压过程中α碳化硅(SiC)的致密​​化行为。获得了接近理论密度,且总烧结添加剂含量小于4%(体积)。用AIN + Y_2O_3烧结的SiC的微观结构显示出细小的等轴晶粒,与仅用AIN烧结的SiC表现出的其他细长晶粒相对。对于望远镜镜应用,具有高密度的SiC表现出非常好的强度,弹性模量,高的导热性,低的热膨胀系数和出色的可抛光性。

著录项

  • 来源
    《Optical engineering》 |2011年第7期|p.070504.1-070504.3|共3页
  • 作者单位

    Vikram Sarabhai Space Centre, Materials & Metallurgy Group, Trivandrum, 695022, India,Indian Institute of Technology Madras, Department of Metallurgical and Materials Engineering, Chennai, 600036, India;

    Vikram Sarabhai Space Centre, Materials & Metallurgy Group, Trivandrum, 695022, India;

    Vikram Sarabhai Space Centre, Materials & Metallurgy Group, Trivandrum, 695022, India;

    Vikram Sarabhai Space Centre, Materials & Metallurgy Group, Trivandrum, 695022, India;

    Indian Institute of Technology Madras, Department of Metallurgical and Materials Engineering, Chennai, 600036, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    silicon carbide; hot pressing; densification; thermal conductivity; mirror;

    机译:碳化硅热压致密化导热系数;镜子;

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