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Wavelength dispersion phenomena observed for emitted optical radiation from a p+nn+ silicon avalanche mode light-emitting device in a radio frequency bipolar-integrated circuitry

机译:从射频双极集成电路中的p + nn +硅雪崩模式发光器件发出的光辐射观察到的波长色散现象

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摘要

A two-junction micro p+np+ silicon avalanche-mode light-emitting device (Si AMLED) is analyzed for its dispersion characteristics, which generally resulted in different wavelengths of light (colors) being emitted at different angles from the surface of the device. The SiAMLED is integrated into on-chip bipolar radio frequency-integrated circuitry at micron dimensions. LEDs have high-frequency modulation frequencies reaching into the GHz range. Such devices, which are of micron dimension, operate at 8 to 10 V, 1 μA to 2 mA. The emission wavelength is in the 450- to 850-nm range, emission spot sizes are about 1 μm~2, and emission intensities are up to 200 nW.μm~(-2). The observed geometrical-chromatic dispersion characteristics range from 0.01 degm wavelength for green radiation at a 5 deg exit angle to the normal of the device to 0.16 degm wavelength for blue radiation at a 60 deg exit angle to the normal of the surface of the device. The high dispersion characteristics of the emitted radiation are attributed to the positioning of the optical source ~1 μm subsurface to the silicon-silicon oxide interface, as well as to the high-refractive index differences between silicon and the surrounding lower refractive index silicon oxide layers. It is believed that the identified dispersion characteristics will have interesting and futuristic on-chip electro-optic applications for on-chip micro-optical wavelength dispersers, futuristic optical communication demultiplexers, along with on-chip microgas and biosensor applications.
机译:对两结型微p + np +硅雪崩模式发光器件(Si AMLED)的色散特性进行了分析,通常会导致从器件表面以不同角度发射不同波长的光(颜色)。 SiAMLED被集成到微米级的片上双极射频集成电路中。 LED的高频调制频率达到GHz范围。此类器件的尺寸为微米,工作电压为8至10 V,1μA至2 mA。发射波长在450-850 nm范围内,发射光斑大小约为1μm〜2,发射强度高达200nW.μm〜(-2)。观察到的几何色散特性的范围是:从5度出射角到设备法线的绿色辐射的0.01度/ nm波长到从60度出射角到表面法线的蓝色辐射的0.16度/ nm波长设备的发射辐射的高色散特性归因于光源位于硅氧化硅界面下约1μm的次表面,以及硅与周围较低折射率的氧化硅层之间的高折射率差。据信,所识别的色散特性将对于片上微光学波长色散器,未来派光通信多路分解器以及片上微气体和生物传感器应用具有有趣的和未来的片上电光应用。

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