Effect of X-ray irradiation on the optical properties of nanostructured thin films TCVA based on structural analysis

摘要

Nanocrystalline thin films of 4-tricyanovinyl-N,N-diethylaniline (TCVA) were prepared by the thermal evaporation method. TCVA thin films were irradiated by X-ray radiation at room temperature with different absorbed doses up to 2500 Gy. The structural properties of TCVA pre and post irradiation have been investigated using Fourier-transform infrared and X-ray diffraction. Spectrophotometric measurements were utilized to study the optical transmittance and optical reflectance for TCVA, pre and post irradiation and consequently optical parameters were calculated. At 850 nm, the refractive index of TCVA thin films increases by approximately 16% when the dose increases from 0 to 2500 Gy. It is found that a slight modification in the energy band gap occurred while a significant change appeared in the refractive index. These results are useful for the manufacture of diffractive optical components or integrated optical parts.