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Measurements of Total Hemispherical Emissivity of A508/A533B Alloy Steel

机译:A508 / A533B合金钢总半球发射率的测量

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摘要

The total hemispherical emissivity of A508/A533B alloy steels was measured for conditions of interest in nuclear plant safety. The effect of long-term oxidation on the emissivity of A508/A533B was simulated by oxidizing test samples using a three-zone tube furnace at temperatures of 573 and 773 K. An apparatus built and operated in compliance with the American Society for Testing and Materials C835-06 testing standard was used to measure the total hemispherical emissivity for the following surface conditions: (1) mirror-like polished (unoxidized), (2) polished surface oxidized in air, (3) wire-cut electrical discharge machining (EDM), and (4) EDM-cut surface oxidized in air. The emissivity of polished (unoxidized) A508/A533B strips varied from 0.16 to 0.24 within the temperature range from 552 to 1180 K. Increasing the oxidation time of polished A508/A533B from 10 to 100 h at 573 K provided slight increase in emissivity, whereas increasing the oxidation temperature from 573 to 773 K for a 10-h duration provided over a threefold increase in emissivity. EDM-cut surfaces had an emissivity of 0.51 at 464 K to 0.54 at 845 K due to the inherent roughness and the presence of a recast layer and possible oxidation layer. Oxidizing EDM-cut A508/A533B in air at 573 K increased the emissivity compared to the unoxidized EDM-cut A508/A533B, but no additional increase in emissivity occurred from 500- to 1000-h durations. Further oxidation of A508/A533B oxidized at 573 K for 1000 h for an additional 500 h at 773 K resulted in spallation of the oxide layer. The emissivity of the sample with loose oxide removed had similar emissivity for EDM-cut A508/A533B at 537 K.
机译:在核电站安全方面,对A508 / A533B合金钢的总半球形发射率进行了测量。长期氧化对A508 / A533B发射率的影响是通过使用三区管式炉在573和773 K的温度下氧化测试样品来模拟的。根据美国测试和材料学会的要求建造和运行的设备使用C835-06测试标准在以下表面条件下测量总半球形发射率:(1)镜面抛光(未氧化),(2)空气中氧化的抛光表面,(3)线切割放电加工(EDM) ),以及(4)EDM切割的表面在空气中被氧化。抛光(未氧化)的A508 / A533B条的发射率在552至1180 K的温度范围内从0.16到0.24不等。将抛光的A508 / A533B在573 K下的氧化时间从10 h增加到100 h,发射率略有增加,而在10个小时内将氧化温度从573 K升高到773 K,使发射率提高了三倍。由于固有的粗糙度以及存在重铸层和可能的氧化层,EDM切割表面的发射率在464 K时为0.51,在845 K下为0.54。与未氧化的EDM切割的A508 / A533B相比,在573 K的空气中氧化EDM切割的A508 / A533B可以提高发射率,但是从500小时到1000小时的持续时间,发射率没有其他增加。在573 K氧化的A508 / A533B进一步氧化,在773 K氧化1000 h,再氧化500 h,导致氧化层剥落。对于EDM切割的A508 / A533B,在537 K下,去除了疏松氧化物的样品的发射率具有相似的发射率。

著录项

  • 来源
    《Nuclear Technology》 |2019年第7期|951-963|共13页
  • 作者单位

    Univ Technol Baghdad, Dept Electromech Engn, Baghdad, Iraq|Univ Missouri, Mech & Aerosp Engn, Columbia, MO 65211 USA;

    Univ Missouri, Nucl Sci & Engn Inst, Columbia, MO 65211 USA|Univ Missouri, Particulate Syst Res Ctr, Columbia, MO 65211 USA;

    Univ Missouri, Mech & Aerosp Engn, Columbia, MO 65211 USA|Univ Missouri, Nucl Sci & Engn Inst, Columbia, MO 65211 USA|Univ Missouri, Particulate Syst Res Ctr, Columbia, MO 65211 USA;

    Univ Missouri, Nucl Sci & Engn Inst, Columbia, MO 65211 USA|Univ Missouri, Particulate Syst Res Ctr, Columbia, MO 65211 USA|Univ Missouri, Chem Engn, Columbia, MO 65211 USA;

    Univ Missouri, Mech & Aerosp Engn, Columbia, MO 65211 USA|Univ Missouri, Nucl Sci & Engn Inst, Columbia, MO 65211 USA|Univ Missouri, Particulate Syst Res Ctr, Columbia, MO 65211 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Total hemispherical emissivity; reactor pressure vessel; A508/A533B low alloy steel;

    机译:总半球发射率;反应堆压力容器;A508 / A533B低合金钢;
  • 入库时间 2022-08-18 04:20:04

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