RBS in situ studies of the kinetics of optically-induced diffusion of Ag in vacuum evaporated films with composition of As_(33)S_(67)

摘要

Optically-induced dissolution and diffusion (OIDD) of Ag into thin films of amorphous vacuum evaporated films with composition AS_(33)S_(67) has been studied. Rutherford backscattering spectrometry (RBS), as a non-destructive method for depth profiles measurements, was used for in situ measurements of the OIDD process. A bilayer of Ag/As_(33)S_(67) deposited on quartz substrate was placed into RBS measuring chamber and step-by-step illuminated by the second harmonic green light from solid state Nd-doped laser with beam diameter of 5 mm, a wavelength of 532 nm and a power output of 21 mW. Silver diffusion depth profile development has been resolved using GISA 3 code. The silver diffusion profiles can be described by an error function. Their behaviour is typical for diffusion process from limited source influenced by chemical reaction of silver on the boundary between doped and undoped film.