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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Initial stage of etching through pores in PET films irradiated by Ar ions
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Initial stage of etching through pores in PET films irradiated by Ar ions

机译:通过Ar离子辐照的PET膜中的孔蚀刻的初始阶段

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Changes in the diameters and depths of pores were studied in the process of etching polyethyleneterephthalate (PET) films irradiated by Ar ions having an energy of 1 MeV. Information about the pore diameters and lengths was obtained with JSM-840 and TEM-125 electron microscopes. The solutions of NaOH (0.5 mol/dm~3 and 2 mol/dm~3) were used as etchants. Etching was performed at 55℃ and 70℃. Two methods of sensitization were used: the first one by UV illumination and treatment in dimethylformamide (DMF), the second method just by UV illumination. It was found that the diameters and the depths of pores are larger in films treated according to the first sensitization method. Etching duration (breakthrough time), which leads to through-going pores of the minimal radius, was established. After sensitization according to the first method the track etch rate grows quicker than the transverse etch rate. This gives a possibility to obtain through pores with diameters ranging from 50 nm to several micrometers.
机译:在蚀刻由能量为1 MeV / n的Ar离子辐照的聚对苯二甲酸乙二醇酯(PET)膜的过程中,研究了孔的直径和深度的变化。有关孔径和长度的信息是使用JSM-840和TEM-125电子显微镜获得的。使用NaOH溶液(0.5 mol / dm〜3和2 mol / dm〜3)作为蚀刻剂。在55℃和70℃下进行蚀刻。使用了两种敏化方法:第一种通过紫外线照射和在二甲基甲酰胺(DMF)中处理,第二种仅通过紫外线照射。发现在根据第一敏化方法处理的膜中,孔的直径和深度较大。确定了蚀刻持续时间(突破时间),该蚀刻持续时间导致了最小半径的贯穿孔。在根据第一种方法敏化之后,轨迹蚀刻速率比横向蚀刻速率增长得更快。这提供了获得直径范围从50 nm到几微米的通孔的可能性。

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