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Microscopic parameters of materials containing GaN/AlN and InAs/AlAs hetero structures

机译:包含GaN / AlN和InAs / AlAs异质结构的材料的微观参数

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EXAFS spectra of A_ⅢB_V heterostructures have been measured at the European Synchrotron Radiation Facility (ESRF, Grenoble, France), DUBBLE beam-line. It has been found that the first shell R_(Ga-N) interatomic distance in heterostructure GaN/AlN is equal to 1.91 A, which is 0.04 A smaller compared to crystalline GaN. For the second Ga-Ga shell an interatomic distance R_(Ga-Ga) of 3.13 A was found, which is 0.06 A smaller than in crystalline GaN. The coordination number N_(Ga-Ga) was found to be 6.0. Our results suggest that this heterostructure with discrete electronic spectra contains two-dimentional islands with strong elastic strains. The first shell interatomic distance R_(In-As) for the heterostructure containing InAs quantum dots (QDs) is 0.04 A lower in comparison with those for the bulk InAs and is 2.58 A. The second shell interatomic distance R_(In-In) is 3.99 A, i.e. 0.29 A smaller compared to the bulk InAs. The Debye-Waller factor was found to be 0.022 A~2, the coordination number N_(In-In) ~ 2.0. The results obtained suggest that InAs/AlAs heterostructure with discrete electronic spectra contains three-dimentional islands with unhomogeneity of microstructure due to elastic strain relaxation.
机译:A_ⅢB_V异质结构的EXAFS光谱是在欧洲同步辐射装置(ESRF,法国格勒诺布尔)的DUBBLE光束线测量的。已经发现,异质结构GaN / AlN中的第一壳层R_(Ga-N)原子间距离等于1.91 A,比晶体GaN小0.04A。对于第二个Ga-Ga壳,发现原子间距离R_(Ga-Ga)为3.13 A,比晶体GaN小0.06A。发现配位数N_(Ga-Ga)为6.0。我们的结果表明,这种具有离散电子光谱的异质结构包含具有强弹性应变的二维岛。包含InAs量子点(QDs)的异质结构的第一壳层间原子距离R_(In-As)比本体InAs的第一壳层间原子距离R_(In-As)为2.58A。第二壳层原子间距离R_(In-In)为3.99 A,即,比本体InAs小0.29A。发现德拜-沃勒因子为0.022 A〜2,配位数N_(In-In)〜2.0。获得的结果表明,具有离散电子光谱的InAs / AlAs异质结构包含三维岛,由于弹性应变松弛,其微观结构不均匀。

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