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Novel nanocrystalline Gd_2O_3(Eu) scintillator screens with a micro-pixel structure for high spatial resolution X-ray imaging

机译:具有高空间分辨率X射线成像的具有微像素结构的新型纳米晶体Gd_2O_3(Eu)闪烁体屏幕

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摘要

We developed a novel pixel-structured scintillation screen with nanocrystalline Gd_2O_3:Eu particle sizes for high spatial resolution X-ray imaging detectors. Nanocrystalline Gd_2O_3:Eu scintillators were successfully synthesized with a hydrothermal method and a subsequent calcination treatment, which were used as a material for converting incident X-rays into visible light. In this work, silicon-based pixel structures with different 100,50 and 30 urn pixel sizes, a 10 u.m wall width and a 120 urn thickness were prepared with the standard photolithography and the deep reactive ion etching (DRIE) process. Subsequently, a micro-pixel-structured scintillation screen was fabricated by adding the synthesized nanocrystalline Gd_2O_3:Eu scintillating phosphor to pixel-structured silicon arrays. Additionally, X-ray imaging performance such as relative light intensity, X-ray to light response and the spatial resolution in terms of modulation transfer function (MTF) were measured by using an X-ray source and a lens-coupled charge coupled device (CCD) camera system. The light intensity of the pixel-structured nanocrystalline Gd_2O_3:Eu screen was much higher than that of a pixel-structured sample made with a commercial microcrystalline Gd_2O_3:Eu product due to the density of the nanocrystalline Gd_2O_3:Eu scintillating powder-filled silicon structure. As the pixel size of the pixel-structured silicon decreased, the light intensity decreased. However, as the pixel size decreased, the spatial resolution significantly improved with no evident crosstalk from the emitted optical photons between adjacent scintillating pixels. The MTF of pixel-structured nanocrystalline Gd_2O_3:Eu screens with a 100 and a 50 urn pixel size was 20% and 30% at 6 lp/mm, respectively. As a result, this new technology showed that a microchannel structure based on a nanocrystalline Gd_2O_3:Eu scintillator could provide higher light intensity and high spatial resolution imaging compared to conventional microcrystalline scintillating phosphor.
机译:我们开发了一种具有纳米晶Gd_2O_3:Eu粒径的新型像素结构闪烁屏,用于高空间分辨率X射线成像探测器。纳米晶Gd_2O_3:Eu闪烁体是通过水热法和随后的煅烧处理成功合成的,它们被用作将入射的X射线转换为可见光的材料。在这项工作中,采用标准光刻和深反应离子刻蚀(DRIE)工艺制备了具有不同100,50和30 um像素尺寸,壁厚10 µm和120 um厚度的硅基像素结构。随后,通过将合成的纳米晶Gd_2O_3:Eu闪烁荧光粉添加到像素结构的硅阵列中,制成了微像素结构的闪烁屏。此外,还使用X射线源和透镜耦合电荷耦合器件(XF)测量了X射线成像性能,例如相对光强度,X射线对光响应以及调制分辨率(MTF)方面的空间分辨率( CCD)相机系统。像素结构的纳米晶体Gd_2O_3:Eu屏幕的光强度比用市售微晶Gd_2O_3:Eu产品制成的像素结构样品的光强度高得多,这是由于纳米晶体Gd_2O_3:Eu闪烁粉填充的硅结构的密度。随着像素结构的硅的像素尺寸减小,光强度减小。但是,随着像素尺寸的减小,空间分辨率显着提高,相邻闪烁像素之间发射的光子之间没有明显的串扰。像素结构为100和50 um的像素结构纳米晶体Gd_2O_3:Eu屏幕的MTF在6 lp / mm时分别为20%和30%。结果,这项新技术表明,与传统的微晶闪烁荧光粉相比,基于纳米晶Gd_2O_3:Eu闪烁体的微通道结构可以提供更高的光强度和高空间分辨率成像。

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  • 作者单位

    Advanced Medical Device Research Center, Korea Electrotechnotogy Research Institute, Cyeonggi-do, Repulic of Korea;

    Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejoen, Repulic of Korea;

    Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejoen, Repulic of Korea;

    Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejoen, Repulic of Korea;

    Department of Nuclear and Quantum Engineering, Korea Advanced Institute of Science and Technology, Daejoen, Repulic of Korea;

    Department of Nuclear and Quantum Engineering, Korea Advanced Institute of Science and Technology, Daejoen, Repulic of Korea;

    Advanced Medical Device Research Center, Korea Electrotechnotogy Research Institute, Cyeonggi-do, Repulic of Korea;

    Advanced Medical Device Research Center, Korea Electrotechnotogy Research Institute, Cyeonggi-do, Repulic of Korea;

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  • 正文语种 eng
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  • 关键词

    pixelated scintillator; nanocrystalline gd_2o_3:eu scintillator; spatial resolution; x-ray imaging detector;

    机译:像素化闪烁体;纳米gd_2o_3:eu闪烁体;空间分辨率;x射线成像探测器;

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