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Design and performance of the 33-BM beamline at the Advanced Photon Source

机译:高级光子源处33-BM光束线的设计和性能

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The APS sector 33 bending magnet beamline was designed to provide high X-ray flux with relatively small focal spot (1 mm × 0.5 mm with ~10~(12) ph/s/100 mA flux) and energy resolution limited mostly by the intrinsic resolution of the monochromator optics, δE/E=1.5 × 10~(-4). The beamline accepts 4 mrad of the dipole radiation fan and uses a fixed offset design. A collimating mirror is followed by a double-crystal monochromator with a sagitally bent Si second crystal. A second mirror is dynamically bent to vertically focus or to collimate the beam at the experiment location. This design successfully delivers focused X-rays with an energy range from 5 to 38 keV for use in diffraction measurements of thin films, interface structures and bulk materials. The monochromator has scanning capabilities that also enable anomalous scattering techniques. Experiments that demonstrate the performance of the beamline will be described.
机译:APS 33扇形弯曲磁体光束线设计用于提供高X射线通量和相对较小的焦点(1 mm×0.5 mm,具有〜10〜(12)ph / s / 100 mA通量),并且能量分辨率主要受本征限制单色仪光学器件的分辨率δE/ E = 1.5×10〜(-4)。束线接受4毫弧度的偶极辐射风扇,并使用固定偏移设计。准直镜之后是具有矢状弯曲的Si第二晶体的双晶体单色仪。动态地弯曲第二个反射镜以垂直聚焦或在实验位置准直光束。该设计成功地发射了能量范围为5到38 keV的聚焦X射线,用于薄膜,界面结构和块状材料的衍射测量。单色仪具有扫描功能,还可以启用异常散射技术。将描述证明光束线性能的实验。

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