机译:Gafchromic膜的离子辐照响应用于大面积束强度分布测量的研究
Takasaki Advanced Radiation Research Institute, Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;
Takasaki Advanced Radiation Research Institute, Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;
Takasaki Advanced Radiation Research Institute, Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;
Takasaki Advanced Radiation Research Institute, Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;
Takasaki Advanced Radiation Research Institute, Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;
Gafchromic film; Proton beam; Heavy-ion beam; Transverse beam intensity distribution; Uniform intensity distribution; Cyclotron;
机译:Bragg峰的剂量分布:使用EBT和RTQA Gafchromic膜的剂量测量设定为中心梁轴的两个位置
机译:Gafchromic™EBT3膜用于千伏X射线束输出因子测量的研究
机译:Gafchromic™EBT3膜用于千伏X射线束输出因子测量的研究
机译:用全色EBT3膜获得的剂量图像的校正研究,该膜用于质子束辐照的体模中的测量
机译:研究EBT-2 GAFCHROMIC(TM)薄膜模型的能量响应。
机译:使用GafChromic EBT膜的微多叶准直仪的辐射透射泄漏和光束半影测量
机译:使用markus平行板测量表面和累积区域剂量 电离室,Gafchromic EBT3薄膜和高能量mOsFET探测器 光子束