机译:通过溅射沉积在Y衬底上的基于Cu薄膜的非常规光电阴极
Department of Mathematics and Physics 'E. De Giorgi', University of Salento, 73100 Lecce, Italy,National Institute of Nuclear Physics and University of Salento, 73100 Lecce, Italy;
Department of Mathematics and Physics 'E. De Giorgi', University of Salento, 73100 Lecce, Italy;
University of Salento, Department of Mathematics and Physics 'E. De Giorgi', Via per Arnesano, 73100 Lecce, Italy National Institute of Nuclear Physics and University of Salento, 73100 Lecce, Italy;
Department of Mathematics and Physics 'E. De Giorgi', University of Salento, 73100 Lecce, Italy;
Department of Mathematics and Physics 'E. De Giorgi', University of Salento, 73100 Lecce, Italy;
National Council Research, Institute for Microelectronics & Microsystems, 73100 Lecce, Italy;
Institute of Electronics, Bulgarian Academy of Sciences, 1784 Sofia, Bulgaria;
Institute of General and Inorganic Chemistry, Bulgarian Academy of Sciences, 1113 Sofia, Bulgaria;
Department of Physics, Chemistry and Biology (IFM), Linkoeping University, SE-581 83 Linkoeping, Sweden;
Sputtering; Thin films; Electrical resistivity; Photocathodes; Quantum efficiency; Adhesion strength;
机译:磁控溅射沉积在铜基板上的铜和钛薄膜的分层:原因分析
机译:溅射沉积Zn前驱体膜厚和退火时间对金属靶顺序反应溅射沉积Cu2ZnSnS4薄膜性能的影响
机译:通过磁控溅射沉积在Al_2O_3(0001)基板上沉积的Cu薄膜的外延生长和表征
机译:磁控溅射沉积在铜基板上的铜和钛薄膜的分层:原因分析
机译:通过轧制溅射沉积工艺沉积在柔性玻璃基板上的氧化铟锌,氧化铟锡和钼薄膜的表征
机译:在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
机译:通过溅射在Y衬底上沉积非常规Cu薄膜