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Pepperpot emittance measurements of ion beams from an electron beam ion source

机译:来自电子束离子源的离子束的胡椒粉发射率测量

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A pepperpot emittance meter was used to measure the transverse emittance of multiply charged beams from REXEBIS, an Electron Beam Ion Source (EBIS) used for charge breeding of radioactive ion beams. The emittance meter is equipped with a Micro Channel Plate (MCP), a phosphor screen and a CCD camera for detection of the ion signal. The pulsed beam structure of low duty cycle imposes challenging constraints on the detector settings. In this article we give a careful analysis of the optimal operating parameters of the pepperpot emittance meter for ion beams of varying intensities. Emittance values for mass-separated and non-separated beams for different operating modes of the EBIS are presented. Furthermore we report on aberrations created in our injection/extraction system.
机译:胡椒粉发射率仪用于测量来自REXEBIS的多重带电束的横向发射率,EXEBIS是用于放射性离子束电荷繁殖的电子束离子源(EBIS)。发射率计配备有微通道板(MCP),荧光屏和用于检测离子信号的CCD摄像机。低占空比的脉冲光束结构对检测器设置施加了挑战性的约束。在本文中,我们对胡椒罐发射率仪针对不同强度离子束的最佳操作参数进行了仔细分析。给出了EBIS不同工作模式下质量分离和非分离光束的发射率值。此外,我们报告了在我们的注射/萃取系统中产生的像差。

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