Simulation of drop deposition process in annular mist flow using three-dimensional particle method

摘要

The three-dimensional moving particle semi-implicit (MPS) method is employed to simulate the deposition process of single droplet on the liquid film. The model accounts for the presence of inertial, gravitation, viscous and surface tension and is validated by comparison with experimental results. The parameters of liquid droplets and film are calculated by a one-dimensional mixture model in which correlations and methods on void fraction, entrainment fraction and droplet velocity and size distribution are employed. The simulation results are analyzed to study the effect of splash on the deposition and re-entrainment processes in annular-mist flow. It is found that splash plays an important role in the deposition and re-entrainment processes in high quality conditions of BWR.