Process & Production Engineering

摘要

Gaio Technology Co., Ltd. has developed and started marketing a reticle management system for the complex management of the number of uses of a mask (reticle) for developing semiconductor printed circuit patterns onto wafers, for washing and recovering these masks and for managing the durability of these masks. This is the first system developed in Japan for the complex management of various items, and a system with a rack for accommodating 450 cases of reticles is sold for ¥9,850,000.