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Electronics & Optics

机译:电子与光学

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Toppan Printing Co., Ltd. has developed a circuit mask for electron beam (EB) exposure systems that can engrave ultrafine circuits at line widths of less than 0.1μm. This is a mask that is designed for use in products beyond the 50nm design rule that has been established for compliance with the needs of several future generations, in the face of the further establishment of technologies for producing semiconductors which are getting increasingly minute. The new product is a block mask that extracts the patterns employed frequently for producing semiconductor circuits as a common pattern and establishes them in block form. The pattern is penetrated into silicon wafers and an electron beam passed through to transcribe the the pattern on a wafer.
机译:凸版印刷有限公司已经开发出一种用于电子束(EB)曝光系统的电路掩模,可以在小于0.1μm的线宽上雕刻超细电路。面对进一步发展的生产半导体技术的日益发展,这是一种掩模,其设计用于超出50nm设计规则的产品,该规则已被确定为符合未来几代人的需求。新产品是一种防区罩,可将通常用于生产半导体电路的图形提取为通用图形,并以方框形式建立它们。图案穿透到硅晶片中,并且电子束穿过以将图案转录在晶片上。

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