Infrared Reflection Absorption Spectroscopy of Selective Etching And Decomposition Stimulated by Synchrotron Radiation

摘要

The study of processing stimulated by synchrotron radiation (SR) started about 13 years ago. Unfortunately, for semi- conductor processing, the reaction rate of this technique was considered to be too slow for practical applications. However the situation is rapidly changing as de- vice dimensions shrink to the nanometer range, which requires high controllabil- ity and low defect densities, but is not so reliant on quick processing since much less material is involved.