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FINFET ROADMAP ENDS AT 3NM: TSMC Plans Production in 2H22; Samsung Will Employ Nanosheets

机译:Finfet路线图在3nm结束:台积电计划在2H22中生产; 三星将雇用纳米表

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The FinFET has enjoyed a good 10-year run, but the next process node will likely be its last. TSMC is sticking with these vertical-channel devices for its 3nm process, which it says is on schedule for volume production starting in 2H22. We expect Samsung will offer a 4nm optical shrink of its 5nm FinFET design rules in 4Q21, but it plans to abandon FinFETs for nanosheet gate-all-around (GAA) technology at 3nm.Because shrinking nanometer devices is increasingly difficult, the time between major process nodes is growing. TSMC began 5nm production in 2Q20, but its 3nm process won't reach volume production until late 2022, as Figure 1 shows. In the meantime, it plans to start pilot (risk) production in 3Q21 for its 4nm process, which reduces cost thanks to a 6% optical shrink of the foundry's 5nm design rules. Volume production for that process will likely begin around mid-2022.
机译:Finfet享有10年的10年的运行,但下一个流程节点可能是它的最后一个。 TSMC与这些垂直通道设备粘附在3NM过程中,它表示在2H22开始的批量生产调度。 我们预计三星将在4Q21中提供5nm Finfet设计规则的4nm光学缩小,但计划在3nm下放弃用于纳米液门(Gaa)技术的FinFet。虽然纳米器件越来越困难,主要 流程节点正在增长。 TSMC于2Q20开始生产5nm,但其3nm过程直到2022年晚期达到批量生产,如图1所示。 与此同时,它计划在第3季度开始于第3季度生产4nm过程,这使得铸造的5nm设计规则的6%光学缩小降低了成本。 该过程的批量生产可能会在2022年中期开始。

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