Characterization of NH_3 plasma-treated Ba_0.7Sr_0.3TiO_3 thin films

摘要

The effects of plasma surface treatment, using NH_3 gas, of Ba_0.7Sr_0.3 (BST) films on the leakage and dielectric characteristics of a Pt/BST/Pt capacitor were investigated. As a result of the exposure of BST to the plasma, the leakage current density of the BST capacitor can be improved by three orders of magnitude as compared to that of the nonplasma-treated sample at an applied voltage f 1.5 V. Nevertheless, the surface morphology of BST was also changed by the NH_3 plasma, as explored by atomic force microscopy. From the X-ray photoelectron spectroscopy examination, the existence of the N 1 s peak was observed in the plasma-treated sample. It induces the additional space charge and results in the reduction of the dielectric constant.