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首页> 外文期刊>Microelectronics & Reliability >The impact of copper contamination on the quality of the second wire bonding process using X-ray photoelectron spectroscopy method
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The impact of copper contamination on the quality of the second wire bonding process using X-ray photoelectron spectroscopy method

机译:铜污染对使用X射线光电子能谱法进行的第二焊线工艺质量的影响

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A lot of wedge bonding failures were observed on the leadframe (LF) type A due to non-stick on lead (NSOL) during the second wire bonding process of TQFP package. The copper ion contamination from the plating process was identified as one of the key factors that attributed to the NSOL failures. Surface analyses were performed in terms of X- ray photoelectron spectroscopy on the surface of LF type A. It was found that as received silver-plated surface of the copper LF type A was contaminated by the copper.
机译:在TQFP封装的第二个引线键合过程中,由于不粘引线(NSOL),在A型引线框(LF)上观察到很多楔形键合失败。电镀过程中的铜离子污染被确定为NSOL失效的关键因素之一。用X射线光电子能谱对LF型A的表面进行了表面分析。发现在接收时,LF型A的铜的镀银表面被铜污染。

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