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On discrete random dopant modeling in drift-diffusion simulations: physical meaning of 'atomistic' dopants

机译:关于漂移扩散模拟中的离散随机掺杂物建模:“原子”掺杂物的物理含义

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摘要

we investigate the physics behind the 'atomistic' dopant model used in drift-diffusion (DD) simulators for the study of statistical threshold voltage variations in ultra-small MOSFETs. It is found that the conventional dopant model, when extended to the extreme atomistic regime, becomes physically inconsistent with the concepts of electric potential presumed in DD device simulations. The splipt of the Coulomb potential between the long-range and short- range parts associated with discretized dopants is critical for the device simulations under the atomistic regime. A new dopant model to overcome such problems for 3-dimensional DD simulations is proposed by employing this idea.
机译:我们研究了漂移扩散(DD)模拟器中用于“原子”掺杂模型的物理原理,以研究超小型MOSFET的统计阈值电压变化。已经发现,当传统的掺杂剂模型扩展到极端原子态时,在物理上与DD器件仿真中假定的电势概念不一致。与离散化掺杂剂相关的长距离和短距离部分之间的库仑电势闪变对于原子态下的器件仿真至关重要。通过采用这种思想,提出了一种新的克服上述问题的3D DD模拟掺杂剂模型。

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