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The Impact of CMOS technology scaling on MOSFETs second breakdown: Evaluation of ESD robustness

机译:CMOS技术扩展对MOSFET的影响第二次击穿:ESD鲁棒性评估

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The impact of CMOS technology scaling on the second breakdown of ESD protection devices has been investigated using 2-D simulations and analytical calculations. It is shown that the second breakdown trigger current (It_2) can not be reliably used as an ESD robustness criterion in sub-0.18 um ED protection devices. When a technology feature size is reduced, the doping of drain and drain extension regions is significantly increased. Thus, the ESD device failure due to the self-heating effect occurs without the second snapback region in high current Ⅰ-Ⅴ curve and It_2 current can not be properly extracted. Instead of It_2 current criterion, we propose to use the maximum failure temperature criterion.
机译:CMOS技术扩展对ESD保护器件第二次击穿的影响已使用二维仿真和分析计算进行了研究。结果表明,在0.18um以下的ED保护设备中,第二击穿触发电流(It_2)不能可靠地用作ESD鲁棒性标准。当减小技术特征尺寸时,漏极和漏极延伸区的掺杂显着增加。因此,由于自发热效应而导致的ESD器件故障会在没有高电流Ⅰ-Ⅴ曲线中的第二骤回区域的情况下发生,并且无法正确提取It_2电流。我们建议使用最大故障温度准则代替It_2当前准则。

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