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首页> 外文期刊>Microelectronics & Reliability >Out of plane vs. in plane flexural behaviour of thin polysilicon films: mechanical characterization and application of the Weibull approach
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Out of plane vs. in plane flexural behaviour of thin polysilicon films: mechanical characterization and application of the Weibull approach

机译:多晶硅薄膜的平面外与平面内弯曲行为:力学表征和威布尔方法的应用

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摘要

A new MEMS for on-chip mechanical testing of 0.7 μm thick LPCVD polysilicon film has been designed, modelled and fabricated. The polysilicon film is electrostatically loaded under bending until rupture in the out of plane direction. Electrostatical numerical simulations were carried out to evaluate the force developed by the actuator and the capacitance measured by the sensing electrodes while structural numerical simulations were used to compute the stress field into the specimen and its stiffness. Elastic properties and ultimate strength of the material were determined. Comparative studies were performed to investigate the variation of the ultimate strength of the polysilicon film with different loading conditions.
机译:设计,建模和制造了一种新的MEMS,用于对0.7μm厚的LPCVD多晶硅膜进行片上机械测试。多晶硅膜在弯曲下被静电加载,直到在平面外方向上破裂。进行了静电数值模拟,以评估执行器产生的力和传感电极测得的电容,同时使用结构数值模拟来计算样品的应力场及其刚度。确定了材料的弹性和极限强度。进行了比较研究,以研究不同负载条件下多晶硅膜的极限强度的变化。

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