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Electrical properties in low temperature range (5 K-300 K) of Tantalum Oxide dielectric MIM capacitors

机译:氧化钽电介质MIM电容器在低温范围(5 K-300 K)中的电性能

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摘要

Tantalum oxide (Ta_2O_5) is widely used for MIM (Metal-Insulator-Metal) capacitor owing of its high dielectric constant. This work examines current-voltage and capacitance-voltage characteristics in the 5 K-300 K temperature range. Working at low temperature was chosen in order to freeze trapping mechanisms of the MIM capacitor. The curvature of C-V characteristics radically changes from 5 K to 300 K. The capacitance variation under voltage at 50 K and below can be investigated using the Langevin theory. From this model the permanent dipole moment and the number of dipoles have been extracted. From Poole-Frenkel identification curves, activation energy around 0.20 eV and a dielectric constant of 26 were found for positive polarisation. However, conduction mechanisms cannot be reduced to strick Poole-Frenkel modelling.
机译:氧化钽(Ta_2O_5)由于具有较高的介电常数而被广泛用于MIM(金属-绝缘体-金属)电容器。这项工作研究了5 K-300 K温度范围内的电流-电压和电容-电压特性。选择在低温下工作以冻结MIM电容器的陷获机制。 C-V特性的曲率从5 K急剧变化到300K。可以使用Langevin理论研究在50 K及以下电压下的电容变化。从该模型中提取出了永久偶极矩和偶极数。根据Poole-Frenkel鉴定曲线,发现正极化的活化能约为0.20 eV,介电常数为26。但是,传导机制无法降低以激发Poole-Frenkel建模。

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