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A review of CMOS latchup and electrostatic discharge (ESD) in bipolar complimentary MOSFET (BiCMOS) Silicon Germanium technologies: Part II—Latchup

机译:双极互补MOSFET(BiCMOS)硅锗技术中的CMOS闩锁和静电放电(ESD)综述:第二部分-闩锁

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摘要

CMOS latchup and electrostatic discharge (ESD) continue to be a semiconductor quality and reliability area of interest as semiconductor components continue to be reduced to smaller dimensions. The combination of scaling, design integration, circuit performance objectives, new applications, and the evolving system environments, CMOS latchup and ESD robustness will continue to be a technology concern. With both the revolutionary and evolutionary changes in CMOS and Silicon Germanium semiconductor technologies, and changing product environments, new CMOS latchup and ESD requirements also continue in semiconductor design, device and chip-level simulation, design verification, chip-to-system evaluation, and the need for new latchup and ESD test specifications. Additionally, the issues of low cost, low power and radio frequency (RF) GHz performance objectives has lead to both revolutionary as well as derivative technologies; these have opened new doors for discovery, development and research in the area of latchup and ESD. Although latchup and ESD are not a new reliability arena, there are also new issues rising each year, making the latchup and ESD an area of continuous discovery, innovation and invention. In this paper, an introduction to latchup in CMOS and BiCMOS Silicon Germanium will be discussed.
机译:CMOS闩锁和静电放电(ESD)继续成为半导体质量和可靠性的关注领域,因为半导体组件不断缩小尺寸。缩放,设计集成,电路性能目标,新应用以及不断发展的系统环境,CMOS闩锁和ESD鲁棒性的组合将继续成为技术关注的问题。随着CMOS和硅锗半导体技术的革命性和演进性变化以及不断变化的产品环境,半导体设计,器件和芯片级仿真,设计验证,芯片到系统评估以及对新的闩锁和ESD测试规范的需求。此外,低成本,低功耗和射频(RF)GHz性能目标的问题已导致革命性技术以及衍生技术;这些为闩锁和ESD领域的发现,开发和研究打开了新的大门。尽管闩锁和ESD并不是一个新的可靠性领域,但每年还会出现新的问题,这使闩锁和ESD成为不断发现,创新和发明的领域。本文将讨论CMOS和BiCMOS硅锗中的闩锁。

著录项

  • 来源
    《Microelectronics & Reliability》 |2005年第4期|p.437-455|共19页
  • 作者

    Steven H. Voldman;

  • 作者单位

    Silicon Germanium Development, Semiconductor Research and Development Center (SRDC), IBM, 1000 River Street, MS 972F, Bldg 972-1 Col A8, Essex Junction, VT 05452, United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 一般性问题;
  • 关键词

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