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Multi-vibrational hydrogen release: Physical origin of T_(bd),Q_(bd) power-law voltage dependence of oxide breakdown in ultra-thin gate oxides

机译:多振动氢释放:超薄栅氧化物中T_(bd),Q_(bd)幂律电压与氧化物击穿的物理关系

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摘要

In this work we report an experimental observation of the current dependence on the defect generation probability driving to breakdown. We propose the MVHR model (multi-vibrational hydrogen release) based on the multi-vibrational excitation of the Si-H bond stretching mode. By this way we explain the power-law dependence of charge and time to breakdown and highlight its limit on PMOS inversion.
机译:在这项工作中,我们报告了一个实验观察,即当前对导致击穿的缺陷生成概率的依赖性。我们提出了基于Si-H键拉伸模式的多振动激发的MVHR模型(多振动氢释放)。通过这种方式,我们解释了电荷与击穿时间的幂律相关性,并突出了其对PMOS反转的限制。

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