Influence of polysilicon film thickness on radiation response of advanced excimer laser annealed polycrystalline silicon thin film transistors

摘要

This paper presents results of gamma irradiation effects in advanced excimer laser annealed polysilicon thin film transistors realized in polysilicon films having different thicknesses. It is shown that the thickness of polysilicon film has a strong influence on the degradation level of electrical parameters of irradiated thin film transistors, offering a possibility for optimization of these devices with the purpose to increase their reliability. The analysis was performed by monitoring of important electrical parameters, as well as of the density of irradiation induced oxide trapped charge and interface traps at the oxide-polysilicon interface, and the density of polysilicon grain boundary traps in the channel region of the transistors.