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Study of passivation defects by electroluminescence in AlGaN/GaN HEMTS on SiC

机译:SiC上AlGaN / GaN HEMTS中电致发光钝化缺陷的研究

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摘要

This paper presents a new method of passivation control by electroluminescence (EL) in 0.15 μm AlGaN/GaN HEMT. The electroluminescence signature in one finger HEMTs (W= 1 × 100 μm), and eight fingers ones (W= 8 × 125μm), is modified by defects located at the passivation/semiconductor interface and is characterized by a light emission along the drain contact. This abnormal emission reveals some modification of the electric field distribution in the gate-drain space probably induced by traps located at the passivation/semiconductor interface. These traps contribute to the creation of a virtual gate in the gate-drain space.
机译:本文提出了一种在0.15μmAlGaN / GaN HEMT中通过电致发光(EL)进行钝化控制的新方法。一只手指的HEMT(W = 1×100μm)和八个手指的HEMT(W = 8×125μm)中的电致发光签名被钝化/半导体界面处的缺陷所修饰,其特征是沿着漏极触点发光。这种异常发射揭示了可能由位于钝化/半导体界面的陷阱引起的栅漏空间中电场分布的某种改变。这些陷阱有助于在栅极-漏极空间中创建虚拟栅极。

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