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Influence of substrate thickness on thermal impedance of microelectronic structures

机译:基板厚度对微电子结构热阻的影响

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摘要

The thermal impedance Z_(th)(jω) has been calculated numerically, using the boundary element method, for a silicon substrate with a uniform heat source on top. The key feature is that the dynamic thermal behaviour is calculated directly in the frequency domain. The calculations were performed for a wide range of values for the thickness of the substrate. By representing the thermal impedance in a Nyquist plot (i.e. Im[Z_(th)(jω)] vs. Re[Z_(th)(jω)] with ω as parameter), mainly two circular arcs are observed. For the lower frequency arc, the impedance values as well as the frequency scale are found to be largely influenced by the substrate thickness. The arc corresponding to high frequencies on the other hand remains unchanged under thickness variations. Further analysis revealed an almost perfectly linear relationship between the thermal resistance R_(th) = Z_(th)(jω = 0) and the substrate thickness, even when the heat source is not centred on the substrate. Both the slope and intersection value obtained from the curve fitting can be explained by a simple geometrical model including the fixed-angle heat spreading approximation, used since many years in the literature.
机译:对于边界顶部为均匀热源的硅基板,已经使用边界元法对热阻Z_(th)(jω)进行了数值计算。关键特征是动态热行为直接在频域中计算。对基板厚度的宽范围值进行计算。通过以奈奎斯特图表示热阻(即,以ω为参数的Im [Z_(th)(jω)]与Re [Z_(th)(jω)]),主要观察到两个圆弧。对于较低频率的电弧,发现阻抗值以及频率标度在很大程度上受衬底厚度的影响。另一方面,对应于高频的电弧在厚度变化下保持不变。进一步的分析表明,即使热源不在基板上,热阻R_(th)= Z_(th)(jω= 0)与基板厚度之间也几乎是完美的线性关系。从曲线拟合中获得的斜率和交点值都可以用一个简单的几何模型来解释,该模型包括固定角度热扩散近似值,这在文献中已有多年使用。

著录项

  • 来源
    《Microelectronics & Reliability》 |2007年第3期|p.437-443|共7页
  • 作者

    B. Vermeersch; G. De Mey;

  • 作者单位

    Ghent University, Department of Electronics and Systems (ELIS), Sint Pietersnieuwstraat 41, 9000 Gent, Belgium;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 一般性问题;
  • 关键词

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