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Micro-mechanical testing of SiLK by nanoindentation and substrate curvature techniques

机译:通过纳米压痕和衬底曲率技术对SiLK进行微机械测试

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摘要

Advanced micro-mechanical characterization methods provide material properties of thin films for modeling thermo-mechanical behavior of thin films for micro-electronic applications. Here, we focus on the local measurement method of nanoindentation for finding visco-elastic properties, and a global method of substrate curvature testing that provides linear elastic properties. Our specimen SiLK, Dow chemicals, is a low-k dielectric thin polymer film with a thickness of 400 nm, 6 and 8 μm, deposited on Si substrate. Our results show temperature dependent linear elastic and linear visco-elastic material properties for thin film materials.
机译:先进的微机械表征方法可提供薄膜的材料特性,从而为微电子应用的薄膜热机械行为建模。在这里,我们专注于纳米压痕的局部测量方法以寻找粘弹性质,以及提供线性弹性性质的整体基板曲率测试方法。我们的样品SiLK(陶氏化学公司)是一种低k介电聚合物薄膜,厚度为400 nm,6和8μm,沉积在Si衬底上。我们的结果显示了薄膜材料的温度相关线性弹性和线性粘弹性材料特性。

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