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Kelvin probe microscopy for reliability investigation of RF-MEMS capacitive switches

机译:开尔文探针显微镜用于RF-MEMS电容开关的可靠性研究

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摘要

In this work, we investigate the charging and reliability of interlayer dielectric materials that are used in the fabrication process of advanced RF-MEMS switches. In particular, the charge stored on the surface of a dielectric and the dynamic of this charge at nanometric scale are studied. More attention is given to the decay of the deposited charge by a variety of means: (1) surface conduction, (2) surface charge spreading due to self repulsion and (3) charge injection in the bulk of dielectric material. Kelvin force microscopy (KFM) measurements were performed for various injection time and bias voltage. These results suggest a dynamic charge and allow to predict the amount of charge injected into the dielectric.
机译:在这项工作中,我们研究了用于高级RF-MEMS开关制造过程中的层间介电材料的充电性能和可靠性。特别地,研究了存储在电介质表面上的电荷以及该电荷在纳米尺度上的动力学。通过各种方式对沉积电荷的衰减给予了更多关注:(1)表面传导,(2)由于自排斥而引起的表面电荷扩散,以及(3)电荷注入到大部分介电材料中。在各种注入时间和偏置电压下进行开尔文力显微镜(KFM)测量。这些结果表明存在动态电荷,并可以预测注入电介质的电荷量。

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