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Effects of continuously applied stress on tin whisker growth

机译:持续施加应力对锡晶须生长的影响

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A simple four-point bending technique in conjunction with scanning electron microscopy (SEM) was employed to investigate the relationship between continuously applied mechanical stress and tin whisker growth on bright tin-plated copper specimens at room temperature. Measurements of whisker length and density were periodically taken for each specimen during a 7-month exposure to applied stress. Tin whiskers were found on the tin-plated specimens with or without the presence of mechanically applied stresses. A continuously applied compressive stress resulted in formation of longer and more dense tin whiskers, in comparison with the cases of no applied stress and applied tensile stress. However, an increase in the applied compressive stress level caused an increase in the whisker density but a decrease in the whisker length. On the other hand, a continuously applied tensile stress was found to reduce both the whisker density and length, compared to the case of no applied stress. Apparently, application of a continuous tensile stress could provide an effective means in retarding tin whisker growth.
机译:采用简单的四点弯曲技术结合扫描电子显微镜(SEM),研究了室温下连续施加的机械应力与亮锡镀铜样品上锡晶须生长之间的关系。在暴露于施加应力的7个月期间,定期对每个样品进行晶须长度和密度的测量。在有或没有机械施加应力的情况下,在镀锡样品上都发现了锡晶须。与不施加应力和施加拉伸应力的情况相比,连续施加的压缩应力导致形成更长,更致密的锡晶须。然而,所施加的压应力水平的增加导致晶须密度的增加但晶须长度的减少。另一方面,与不施加应力的情况相比,发现连续施加的拉伸应力降低了晶须密度和长度。显然,施加连续的拉应力可以提供一种有效的手段来延缓锡晶须的生长。

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