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High-temperature performance of AlGaN/GaN HFETs and MOSHFETs

机译:AlGaN / GaN HFET和MOSHFET的高温性能

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Performance of AlGaN/GaN HFETs and Al_2O_3/AlGaN/GaN MOSHFETs at the elevated temperatures up to 425 ℃ was investigated. Static output and transfer characteristics were measured and the saturation drain current, the peak transconductance and the series conductance as a function of temperature were evaluated. All these characteristic features of HFETs and MOSHFETs decreased with increased temperature. At 425 ℃ the devices exhibited ~30% of their saturation drain current, peak transconductance and series conductance evaluated at room temperature. The device performance at elevated temperatures follows exactly the T~x dependence with a power x = -1.5. This indicates that the temperature dependence of the mobility of channel electrons due to phonon scattering is the predominant effect describing high-temperature performance of AlGaN/GaN HFETs and MOSHFETs.
机译:研究了AlGaN / GaN HFET和Al_2O_3 / AlGaN / GaN MOSHFET在高达425℃的高温下的性能。测量了静态输出和传输特性,并评估了饱和漏极电流,峰值跨导和串联电导随温度的变化。 HFET和MOSHFET的所有这些特征随温度升高而降低。在425℃时,这些器件的饱和漏极电流,峰值跨导和串联电导在室温下约为30%。器件在高温下的性能严格遵循Tx关系,功率x = -1.5。这表明归因于声子散射的沟道电子迁移率的温度依赖性是描述AlGaN / GaN HFET和MOSHFET高温性能的主要影响。

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