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Design of differential low-noise amplifier with cross-coupled-SCR ESD protection scheme

机译:具有交叉耦合SCR ESD保护方案的差分低噪声放大器的设计

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摘要

The pin-to-pin electrostatic discharge (ESD) stress was one of the most critical ESD events for differential input pads. The pin-to-pin ESD issue for a differential low-noise amplifier (LNA) was studied in this work. A new ESD protection scheme for differential input pads, which was realized with cross-coupled silicon-controlled rectifier (SCR), was proposed to protect the differential LNA. The cross-coupled-SCR ESD protection scheme was modified from the conventional double-diode ESD protection scheme without adding any extra device. The SCR path was established directly from one differential input pad to the other differential input pad in this cross-coupled-SCR ESD protection scheme, so the pin-to-pin ESD robustness can be improved. The test circuits had been fabricated in a 130-nm CMOS process. Under pin-to-pin ESD stresses, the human-body-model (HBM) and machine-model (MM) ESD levels of the differential LNA with the cross-coupled-SCR ESD protection scheme are >8 kV and 800 V, respectively. Experimental results had shown that the new proposed ESD protection scheme for the differential LNA can achieve excellent ESD robustness and good RF performances.
机译:引脚间静电放电(ESD)应力是差分输入焊盘最关键的ESD事件之一。在这项工作中研究了差分低噪声放大器(LNA)的引脚到引脚ESD问题。提出了一种新的用于差分输入焊盘的ESD保护方案,该方案通过交叉耦合可控硅(SCR)实现,以保护差分LNA。交叉耦合SCR ESD保护方案是对常规双二极管ESD保护方案进行了修改,而无需添加任何额外的设备。在这种交叉耦合SCR ESD保护方案中,SCR路径是直接从一个差分输入焊盘到另一差分输入焊盘建立的,因此可以提高引脚间ESD鲁棒性。测试电路是在130纳米CMOS工艺中制造的。在引脚到引脚ESD压力下,采用交叉耦合SCR ESD保护方案的差分LNA的人体模型(HBM)和机器模型(MM)ESD等级分别为> 8 kV和800 V 。实验结果表明,针对差分LNA提出的新ESD保护方案可以实现出色的ESD鲁棒性和良好的RF性能。

著录项

  • 来源
    《Microelectronics reliability》 |2010年第6期|831-838|共8页
  • 作者单位

    Nanoelectronics and Gigascale Systems Laboratory, Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu, Taiwan;

    rnNanoelectronics and Gigascale Systems Laboratory, Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu, Taiwan Department of Electronic Engineering, I-Shou University, Kaohsiung, Taiwan;

    rnNanoelectronics and Gigascale Systems Laboratory, Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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