机译:具有三角形埋入式氧化物的部分SOI LDMOSFET可改善击穿电压
Nanoelectronics Center of Excellence, School of Electrical and Computer Engineering. University of Tehran, Tehran, Iran;
Nanoelectronics Center of Excellence, School of Electrical and Computer Engineering. University of Tehran, Tehran, Iran;
Nanoelectronics Center of Excellence, School of Electrical and Computer Engineering. University of Tehran, Tehran, Iran;
School of Electrical and Computer Engineering, Purdue University, West Lafayette, IN 47907, USA;
机译:新型具有改进电场的局部SOI LDMOSFET,可改善击穿电压
机译:菱形体触头用于改善SOI LDMOSFET的导通击穿电压
机译:具有沟槽和掩埋P层的新型部分SOI LDMOSFET,用于改善击穿电压
机译:考虑阶梯掩埋氧化物界面电荷调制的高压SOI器件击穿模型
机译:闪电脉冲电压下替代变压器液体的预击穿和故障现象
机译:高压应用超晶格GaN-On-Silicon异质结构的高击穿电压和低缓冲液
机译:基于改进Kerr光学测量的纳米Fe3O4对变压器油脉冲击穿电压提高的空间电荷抑制效应
机译:暴露于气体等离子体后聚偏二氟乙烯薄膜的铝粘附和击穿电压的改善