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Design to suppress return-back leakage current of charge pump circuit in low-voltage CMOS process

机译:在低压CMOS工艺中抑制电荷泵电路的回流泄漏电流的设计

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摘要

A new charge pump circuit has been proposed to suppress the return-back leakage current without suffering the gate-oxide reliability problem in low-voltage CMOS process. The four-phase clocks were used to control the charge-transfer devices turning on and turning off alternately to suppress the return-back leakage current. A test chip has been implemented in a 65-nm CMOS process to verify the proposed charge pump circuit with four pumping stages. The measured output voltage is around 8.8 V with 1.8-V supply voltage to drive a capacitive output load, which is better than the conventional charge pump circuit with the same pumping stages. By reducing the return-back leakage current and without suffering gate-oxide overstress problem, the new proposed charge pump circuit is suitable for applications in low-voltage CMOS IC products.1
机译:已经提出了一种新的电荷泵电路,以抑制回流泄漏电流,而不会遭受低压CMOS工艺中的栅极氧化物可靠性问题。四相时钟用于控制电荷转移器件的导通和关断,以抑制回漏电流。已经在65纳米CMOS工艺中实施了测试芯片,以验证所提出的具有四个抽运级的电荷泵电路。所测得的输出电压约为8.8 V,电源电压为1.8 V以驱动电容性输出负载,这比具有相同泵浦级的传统电荷泵电路要好。通过减少回流泄漏电流且不遭受栅极氧化物过应力问题,新提出的电荷泵电路适用于低压CMOS IC产品中的应用。1

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  • 来源
    《Microelectronics reliability》 |2011年第5期|p.871-878|共8页
  • 作者单位

    Nanoelectronics and Cigascale Systems Laboratory. Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu, Taiwan;

    Nanoelectronics and Cigascale Systems Laboratory. Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu, Taiwan;

    Nanoelectronics and Cigascale Systems Laboratory. Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu, Taiwan,Dept. Of Electronic Engineering, I-Shou University, Kaohsiung, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
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