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Improved performance of trench power MOSFET with SiGeC-based channel

机译:利用基于SiGeC的沟道改善沟槽功率MOSFET的性能

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摘要

A structure of power trench MOSFET with SiGeC-channel is presented in this paper. The models applicable for the SiGeC-channel trench MOSFET (SGCT) are presented and the improved device characteristics by incorporation smaller-sized carbon atoms substitution into the SiGe system are simulated and analyzed. Simulation results show that SiGeC alloy is a promising channel material for power trench MOSFET application. SGCT owns better I_(DS)~V_(ds) characteristic, higher saturated current, lower On-state resistance and bigger breakdown voltage compared to the trench MOSFET devices with SiGe-channel. The stability structure works well and the performance of SGCT is improved by C incorporation though the investigated simulations of On-state resistance and breakdown voltage in different temperatures.
机译:提出了具有SiGeC沟道的功率沟槽MOSFET的结构。提出了适用于SiGeC沟道沟槽MOSFET(SGCT)的模型,并模拟和分析了通过将较小尺寸的碳原子结合到SiGe系统中改善的器件特性。仿真结果表明,SiGeC合金是用于功率沟槽MOSFET应用的有前途的沟道材料。与具有SiGe沟道的沟槽MOSFET相比,SGCT具有更好的I_(DS)〜V_(ds)特性,更高的饱和电流,更低的导通电阻和更大的击穿电压。通过研究C在不同温度下的导通电阻和击穿电压,其稳定性结构工作良好,并且通过掺入C可以改善SGCT的性能。

著录项

  • 来源
    《Microelectronics reliability》 |2011年第2期|p.376-380|共5页
  • 作者单位

    College of Information and Communication Engineering, Harbin Engineering University, 150001 Harbin, China;

    College of Information and Communication Engineering, Harbin Engineering University, 150001 Harbin, China;

    College of Information and Communication Engineering, Harbin Engineering University, 150001 Harbin, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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