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Cu wire bond microstructure analysis and failure mechanism

机译:铜丝键合组织分析及破坏机理

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摘要

In this study, copper wire bonding samples were aged at 205 ℃ in air from 0 h to 2000 h. It was found that the bonding of a Cu wire and an AI pad formed Cu_9Al_4, CuAl, and CuAl_2 intermetallic compounds, and an initial crack was formed by the ultrasonic squeeze effect during thermosonic wire bonding. The cracks grew towards the ball bond center with an increase in the aging time, and the Cl ions diffused through the crack into the ball center. This diffusion caused a corrosion reaction between the Cl ions and the Cu-Al intermetallic phases, which in turn caused copper wire bonding damage.
机译:在这项研究中,铜线键合样品在205℃的空气中老化0h至2000h。发现Cu线和AI垫的结合形成了Cu_9Al_4,CuAl和CuAl_2金属间化合物,并且在热超声线结合期间通过超声挤压效应形成了初始裂纹。随着时效时间的增加,裂纹向球键合中心扩展,Cl离子通过裂纹扩散到球心。这种扩散导致Cl离子与Cu-Al金属间相之间的腐蚀反应,进而导致铜线键合损坏。

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  • 来源
    《Microelectronics reliability》 |2011年第1期|p.119-124|共6页
  • 作者单位

    National Sun Yat-Sen University, Department of Materials and Optoelectronic Science, Kaohsiung, Taiwan, ROC;

    National Sun Yat-Sen University, Department of Materials and Optoelectronic Science, Kaohsiung, Taiwan, ROC;

    National Sun Yat-Sen University, Department of Materials and Optoelectronic Science, Kaohsiung, Taiwan, ROC;

    National Sun Yat-Sen University, Department of Materials and Optoelectronic Science, Kaohsiung, Taiwan, ROC;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
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