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Evaluation by three-point-bend and ball-on-ring tests of thinning process on silicon die strength

机译:通过三点弯曲和圆环测试来评估减薄工艺对硅芯片强度的影响

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摘要

With the onset of ultra-compact packages, systems in package may include stacked dies and mechanical sensors. Thus the thinning of silicon becomes necessary. The risk of failure, especially die crack, is often a major concern in the reliability of electronic packages. Therefore chip strength assessment becomes necessary for reliability prediction. In this paper, three-point-bend test and ball-on-ring test are compared to evaluate the risk of fracture of a silicon die as a function of its thickness, and of surface quality induced by the thinning process. Five thinning processes and six thicknesses (from 300 urn down to 80 urn) are statistically evaluated.
机译:随着超紧凑包装的出现,包装中的系统可能包括堆叠的模具和机械传感器。因此,必须使硅变薄。失败的风险,尤其是芯片破裂的风险,通常是电子封装可靠性的主要关注点。因此,切屑强度评估对于可靠性预测变得必要。在本文中,比较了三点弯曲测试和圆环测试,以评估硅芯片破裂的风险,该风险取决于硅芯片厚度以及薄化工艺引起的表面质量。对五种稀疏工艺和六种厚度(从300微米降低到80微米)进行了统计评估。

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  • 来源
    《Microelectronics & Reliability 》 |2012年第10期| p.2278-2282| 共5页
  • 作者单位

    Universite Bordeaux 1, Laboratoire IMS, CNRS UMR 5218, ENSE1RB, Tatence 33405 Cedex, France,NXP Semiconductors, 2 Anton Philips, Caen 14000, France,IPDiA, 2 Rue de la girafe, Caen 14000, France;

    Universite Bordeaux 1, Laboratoire IMS, CNRS UMR 5218, ENSE1RB, Tatence 33405 Cedex, France;

    Universite Bordeaux 1, Laboratoire IMS, CNRS UMR 5218, ENSE1RB, Tatence 33405 Cedex, France;

    IPDiA, 2 Rue de la girafe, Caen 14000, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
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