首页> 外文期刊>Microelectronics & Reliability >Drain breakdown voltage: A comparison between junctionless and inversion mode p-channel MOSFETs
【24h】

Drain breakdown voltage: A comparison between junctionless and inversion mode p-channel MOSFETs

机译:漏极击穿电压:无结和反相模式p沟道MOSFET的比较

获取原文
获取原文并翻译 | 示例

摘要

A comparative study of the drain breakdown phenomena in junctionless (JL) and inversion mode (IM) p-channel MOSFETs has been investigated experimentally with different V_(Gs), channel widths, and V_(SUB)·In order to explain the dependence of drain breakdown voltages (BV_(DS)) on V_(GS), 3~D device simulation has been also performed. When the device is turned ON, the BV_(DS) is larger in JL than IM transistors. The BV_(DS) is decreased with the increase of |V_(GS)| in IM transistors but it is increased in JL transistors. When the device is turned OFF, the BV_(DS) is larger in IM than JL transistors. The BV_(DS) is decreased with the increase of channel width for JL and IM transistors. The BV_(DS) is decreased in IM transistor when the back surface state of Si film is changed from the accumulation to the inversion but it is almost constant in JL transistors.
机译:通过不同V_(Gs),沟道宽度和V_(SUB),对无结(JL)和反相模式(IM)p沟道MOSFET的漏极击穿现象进行了比较研究。 V_(GS)上的漏极击穿电压(BV_(DS)),还进行了3〜D器件仿真。当器件导通时,JL中的BV_(DS)大于IM晶体管。 BV_(DS)随着| V_(GS)|的增加而减小在IM晶体管中增加,但在JL晶体管中增加。当器件关闭时,IM中的BV_(DS)大于JL晶体管。 BV_(DS)随着JL和IM晶体管的沟道宽度的增加而减小。当Si膜的背面状态从累积变为反转时,IM晶体管中的BV_(DS)减小,但在JL晶体管中其几乎恒定。

著录项

  • 来源
    《Microelectronics & Reliability》 |2012年第10期|p.1945-1948|共4页
  • 作者单位

    Department of Electronics Engineering, University of Incheon, #119 Academi-Ro Yoonsu-Gu, Incheon 406-772, Republic of Korea;

    Department of Electronics Engineering, University of Incheon, #119 Academi-Ro Yoonsu-Gu, Incheon 406-772, Republic of Korea;

    Department of Electronic Materials Engineering, Kwangwoon University, #447-1 Wolgye-Dong Nowon-Gu. Seoul, Republic of Korea;

    Department of Electronic Materials Engineering, Kwangwoon University, #447-1 Wolgye-Dong Nowon-Gu. Seoul, Republic of Korea;

    Department of Electronics Engineering, University of Incheon, #119 Academi-Ro Yoonsu-Gu, Incheon 406-772, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号