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Quantum coupling effects on charging dynamics of nanocrystalline memory devices

机译:量子耦合对纳米晶存储器件充电动力学的影响

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摘要

A model is proposed to account for the impacts of the quantum coupling between the longitudinal and transverse components of the channel electron motion on the charging dynamics of memory devices. The calculations demonstrate that the quantum coupling effects on the charging dynamics of Ge NC (germanium nanocrystalline) memory devices cannot be neglected for high temperature and drift velocity of the channel electrons higher than the thermal velocity. The calculations also show that the charging current of Ge NC memory devices strongly depends on the temperature, drift velocity and effective electron mass of the tunneling oxide layer. The reduction in the barrier height caused by the quantum coupling is its origin. The sensitivity of the effective electron mass of the tunneling oxide layer on the charging current of Ge NC memory devices is a potential method to improve the performance of device.
机译:提出了一个模型来说明沟道电子运动的纵向和横向分量之间的量子耦合对存储设备的充电动力学的影响。该计算表明,对于高温和沟道电子的漂移速度高于热速度,不能忽略对Ge NC(锗纳米晶)存储器件的充电动力学的量子耦合效应。计算还表明,Ge NC存储器件的充电电流强烈取决于隧穿氧化物层的温度,漂移速度和有效电子质量。由量子耦合引起的势垒高度的降低是其原因。隧穿氧化物层的有效电子质量对Ge NC存储器件的充电电流的敏感性是提高器件性能的潜在方法。

著录项

  • 来源
    《Microelectronics & Reliability》 |2014年第2期|404-409|共6页
  • 作者

    Ling-Feng Mao;

  • 作者单位

    Institute of Intelligent Structure and System, School of Urban Rail Transportation, Soochow University, Suzhou 215006, PR China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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