An 8-level 3-bit cell programming technique in NOR-type nano-scaled SONOS memory devices

摘要

An 8-level 3-bit cell programming technique is presented in NOR-type nano-scaled polycrystalline silicon-oxide-nitride-oxide-silicon (SONOS) memory devices. This new operating mode provides the double programming and sensing window over the traditional 4-level cell programming by using a double-side hot hole injection erasing. Compared with the 4-level cell, the storage density of the 8-level cell is greatly improved. However, the cycling endurance and retention properties are not obviously degraded until 1000 program/erase cycling.